Visualization of plasma uniformity in dry etching using the imaging plate

Kiyoshi Arita, Masahiro Etoh, Tanemasa Asano

研究成果: ジャーナルへの寄稿記事

2 引用 (Scopus)

抄録

Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.

元の言語英語
ページ(範囲)519-522
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
16
発行部数2
出版物ステータス出版済み - 3 1 1998

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Dry etching
Visualization
etching
Plasmas
Imaging techniques
ultraviolet radiation
Langmuir probes
Ions
electrostatic probes
Luminescence
Quartz
coverings
quartz
wafers
luminescence
Monitoring

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

これを引用

Visualization of plasma uniformity in dry etching using the imaging plate. / Arita, Kiyoshi; Etoh, Masahiro; Asano, Tanemasa.

:: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 巻 16, 番号 2, 01.03.1998, p. 519-522.

研究成果: ジャーナルへの寄稿記事

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