Wavefront control system for phase compensation in hard X-ray optics

Takashi Kimura, Soichiro Handa, Hidekazu Mimura, Hirokatsu Yumoto, Daisuke Yamakawa, Satoshi Matsuyama, Kouji Inagaki, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

研究成果: Contribution to journalArticle査読

32 被引用数 (Scopus)


A highly precise adaptive optical system that can be used in the hard X-ray region was developed. To achieve highly precise control of the wavefront shape, we discussed an optical system with a bendable mirror of deformation accuracy better than 0.4nm RMS. Using the system, we demonstrated the controllability of the wavefront of a 15nm hard X-ray nanobeam. The intensity profile of the wavefrontmodified beam was in good agreement with the wave-optically calculated profile.

ジャーナルJapanese journal of applied physics
7 PART 1
出版ステータス出版済み - 7 1 2009

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント 「Wavefront control system for phase compensation in hard X-ray optics」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。