Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

Michiteru Yamaura, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Y. A.M. Chobei

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.

元の言語英語
ホスト出版物のタイトルPPPS 2001 - Pulsed Power Plasma Science 2001
出版者Institute of Electrical and Electronics Engineers Inc.
ページ1312-1315
ページ数4
2
ISBN(電子版)0780371208, 9780780371200
DOI
出版物ステータス出版済み - 1 1 2001
外部発表Yes
イベント28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, 米国
継続期間: 6 17 20016 22 2001

その他

その他28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
米国
Las Vegas
期間6/17/016/22/01

Fingerprint

Excimer lasers
Charged particles
excimer lasers
repetition
charged particles
Plasmas
Lasers
lasers
lightning
Lightning

All Science Journal Classification (ASJC) codes

  • Energy Engineering and Power Technology
  • Nuclear Energy and Engineering
  • Nuclear and High Energy Physics

これを引用

Yamaura, M., Hayashi, N., Ihara, S., Satoh, S., & Chobei, Y. A. M. (2001). Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. : PPPS 2001 - Pulsed Power Plasma Science 2001 (巻 2, pp. 1312-1315). [1001791] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.1001791

Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. / Yamaura, Michiteru; Hayashi, Nobuya; Ihara, Satoshi; Satoh, Saburoh; Chobei, Y. A.M.

PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 2 Institute of Electrical and Electronics Engineers Inc., 2001. p. 1312-1315 1001791.

研究成果: 著書/レポートタイプへの貢献会議での発言

Yamaura, M, Hayashi, N, Ihara, S, Satoh, S & Chobei, YAM 2001, Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. : PPPS 2001 - Pulsed Power Plasma Science 2001. 巻. 2, 1001791, Institute of Electrical and Electronics Engineers Inc., pp. 1312-1315, 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001, Las Vegas, 米国, 6/17/01. https://doi.org/10.1109/PPPS.2001.1001791
Yamaura M, Hayashi N, Ihara S, Satoh S, Chobei YAM. Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. : PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 2. Institute of Electrical and Electronics Engineers Inc. 2001. p. 1312-1315. 1001791 https://doi.org/10.1109/PPPS.2001.1001791
Yamaura, Michiteru ; Hayashi, Nobuya ; Ihara, Satoshi ; Satoh, Saburoh ; Chobei, Y. A.M. / Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. PPPS 2001 - Pulsed Power Plasma Science 2001. 巻 2 Institute of Electrical and Electronics Engineers Inc., 2001. pp. 1312-1315
@inproceedings{bbbda2208af34ca39ff090e3c04ae08b,
title = "Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser",
abstract = "This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.",
author = "Michiteru Yamaura and Nobuya Hayashi and Satoshi Ihara and Saburoh Satoh and Chobei, {Y. A.M.}",
year = "2001",
month = "1",
day = "1",
doi = "10.1109/PPPS.2001.1001791",
language = "English",
volume = "2",
pages = "1312--1315",
booktitle = "PPPS 2001 - Pulsed Power Plasma Science 2001",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
address = "United States",

}

TY - GEN

T1 - Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

AU - Yamaura, Michiteru

AU - Hayashi, Nobuya

AU - Ihara, Satoshi

AU - Satoh, Saburoh

AU - Chobei, Y. A.M.

PY - 2001/1/1

Y1 - 2001/1/1

N2 - This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.

AB - This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.

UR - http://www.scopus.com/inward/record.url?scp=84952066064&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84952066064&partnerID=8YFLogxK

U2 - 10.1109/PPPS.2001.1001791

DO - 10.1109/PPPS.2001.1001791

M3 - Conference contribution

VL - 2

SP - 1312

EP - 1315

BT - PPPS 2001 - Pulsed Power Plasma Science 2001

PB - Institute of Electrical and Electronics Engineers Inc.

ER -