Wettability of amorphous diamond-like carbons deposited on Si and PMMA in pulse-modulated plasmas

Ta Lun Sung, Jason Hsiao Chun Yang, Kungen Teii, Shinriki Teii, Chung Ming Liu, Wan Yu Tseng, Li Deh Lin, Shigeru Ono

研究成果: ジャーナルへの寄稿記事

3 引用 (Scopus)

抄録

Pulse-modulated direct-current methane plasmas are used to deposit amorphous diamond-like carbon films on Si and dentistry-use polymethyl methacrylate (PMMA) substrates as a function of the negative pulse voltage applied to the substrate (V max). The films on PMMA show a transition from diamond-like to more graphitic carbon in the Raman spectra with increasing V max, dissimilar to those on Si. This is attributed to easy deformation of PMMA, leading to the low compressive stress of the films (1 to 2 GPa). The contact angle of water for the films on both Si and PMMA is large, ranging from 79° to 94° almost independent of V max, confirming that the films are hydrophobic despite the difference in carbon bonding state. The large dispersion component (41-43 mJ/m 2) of the surface free energy of the films measured from the contact angle of water and 1-bromonaphthalene indicates the high mass density of the films. The small polar component (0.2-3.5 mJ/m 2) is attributed to hydrogen saturation of the surface sites forming nonpolar C-H bonds and, thus, responsible for the hydrophobic behavior.

元の言語英語
記事番号A12
ページ(範囲)1837-1842
ページ数6
ジャーナルIEEE Transactions on Plasma Science
40
発行部数7 PART 1
DOI
出版物ステータス出版済み - 5 29 2012

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wettability
polymethyl methacrylate
diamonds
carbon
pulses
dentistry
water
methane
direct current
free energy
deposits
Raman spectra
saturation
electric potential
hydrogen

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

これを引用

Wettability of amorphous diamond-like carbons deposited on Si and PMMA in pulse-modulated plasmas. / Sung, Ta Lun; Yang, Jason Hsiao Chun; Teii, Kungen; Teii, Shinriki; Liu, Chung Ming; Tseng, Wan Yu; Lin, Li Deh; Ono, Shigeru.

:: IEEE Transactions on Plasma Science, 巻 40, 番号 7 PART 1, A12, 29.05.2012, p. 1837-1842.

研究成果: ジャーナルへの寄稿記事

Sung, TL, Yang, JHC, Teii, K, Teii, S, Liu, CM, Tseng, WY, Lin, LD & Ono, S 2012, 'Wettability of amorphous diamond-like carbons deposited on Si and PMMA in pulse-modulated plasmas', IEEE Transactions on Plasma Science, 巻. 40, 番号 7 PART 1, A12, pp. 1837-1842. https://doi.org/10.1109/TPS.2012.2196057
Sung, Ta Lun ; Yang, Jason Hsiao Chun ; Teii, Kungen ; Teii, Shinriki ; Liu, Chung Ming ; Tseng, Wan Yu ; Lin, Li Deh ; Ono, Shigeru. / Wettability of amorphous diamond-like carbons deposited on Si and PMMA in pulse-modulated plasmas. :: IEEE Transactions on Plasma Science. 2012 ; 巻 40, 番号 7 PART 1. pp. 1837-1842.
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abstract = "Pulse-modulated direct-current methane plasmas are used to deposit amorphous diamond-like carbon films on Si and dentistry-use polymethyl methacrylate (PMMA) substrates as a function of the negative pulse voltage applied to the substrate (V max). The films on PMMA show a transition from diamond-like to more graphitic carbon in the Raman spectra with increasing V max, dissimilar to those on Si. This is attributed to easy deformation of PMMA, leading to the low compressive stress of the films (1 to 2 GPa). The contact angle of water for the films on both Si and PMMA is large, ranging from 79° to 94° almost independent of V max, confirming that the films are hydrophobic despite the difference in carbon bonding state. The large dispersion component (41-43 mJ/m 2) of the surface free energy of the films measured from the contact angle of water and 1-bromonaphthalene indicates the high mass density of the films. The small polar component (0.2-3.5 mJ/m 2) is attributed to hydrogen saturation of the surface sites forming nonpolar C-H bonds and, thus, responsible for the hydrophobic behavior.",
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