Wettability of plasma-treated nanocrystalline diamond films

Jason H.C. Yang, Kungen Tsutsui

研究成果: ジャーナルへの寄稿記事

14 引用 (Scopus)

抄録

The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.%, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.

元の言語英語
ページ(範囲)54-58
ページ数5
ジャーナルDiamond and Related Materials
24
DOI
出版物ステータス出版済み - 4 1 2012

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Diamond films
wettability
diamond films
Wetting
oxygen plasma
hydrogen plasma
Oxygen
Plasmas
methylidyne
microwaves
Hydrogen
Microwaves
oxygen
wetting
surface roughness
Plasma enhanced chemical vapor deposition
free energy
vapor deposition
Surface structure
Free energy

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

これを引用

Wettability of plasma-treated nanocrystalline diamond films. / Yang, Jason H.C.; Tsutsui, Kungen.

:: Diamond and Related Materials, 巻 24, 01.04.2012, p. 54-58.

研究成果: ジャーナルへの寄稿記事

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