X-ray imaging test for a single-stage MEMS X-ray optical system

Ikuyuki Mitsuishi, Yuichiro Ezoe, Kensuke Ishizu, Teppei Moriyama, Yoshitomo Maeda, Takayuki Hayashi, Takuro Sato, Makoto Mita, N. Y. Yamasaki, K. Mitsuda, Mitsuhiro Horade, Susumu Sugiyama, Raul E. Riveros, Taylor Boggs, Hitomi Yamaguchi, Yoshiaki Kanamori, Kohei Morishita, Kazuo Nakajima, Ryutaro Maeda

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ∼20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 ìm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.

本文言語英語
ホスト出版物のタイトル2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
ページ151-152
ページ数2
DOI
出版ステータス出版済み - 2010
外部発表はい
イベント2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 - Sapporo, 日本
継続期間: 8 9 20108 12 2010

出版物シリーズ

名前2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

その他

その他2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Country日本
CitySapporo
Period8/9/108/12/10

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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