X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

研究成果: Contribution to journalArticle査読

11 被引用数 (Scopus)

抄録

Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

本文言語英語
ページ(範囲)3555-3560
ページ数6
ジャーナルThin Solid Films
518
13
DOI
出版ステータス出版済み - 4 30 2010

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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